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AMEC’S PRIMO D-RIE™ ETCH TOOL WINS SEMICONDUCTOR INTERNATIONAL 2009 EDITORS’ CHOICE BEST PRODUCT AWARD
SHANGHAI, China and SAN FRANCISCO, Calif., Jul. 15, 2009—At a ceremony today in San Francisco, Advanced Micro-Fabrication Equipment Inc. (AMEC) was honored with a 2009 Editors’ Choice Best Product Award for its PRIMO D-RIE™ dielectric etch tool by Semiconductor International Magazine. The award recognizes outstanding new products, materials and services—successfully proven in a manufacturing environment—with considerable potential to advance the global semiconductor industry. AMEC’s senior vice president, Zhiyou Du, Ph.D., accepted the award which was presented at the annual SEMICON West tradeshow. Commenting on the win, AMEC’s chairman and CEO, Gerald Z. Yin, Ph.D., noted, “In today’s environment, leadership in the capital equipment market is increasingly being determined by the ability to innovate solutions that deliver cutting-edge technical capabilities with optimized cost of ownership. Our PRIMO D-RIE etch tool was built to address these critical considerations and we’re very pleased to see its innovation validated by this prestigious Best Product award.” Since its market introduction in late 2007, AMEC’s PRIMO D-RIE (very high RF frequency, de-coupled reactive ion etching) tool has been steadily adopted by leading chipmakers in Asia for critical etch applications. Built for 300-mm production of devices at 65-45 nm and beyond, the tool features proprietary technical innovations for superior on-wafer performance, precise matching between stations, and process robustness. A novel dual-station multi-chamber cluster architecture improves productivity by more than 35 percent when compared to single-station cluster systems. Cost of ownership is reduced by an average of 35 percent. The PRIMO D-RIE tool carries the AMEC promise of simple design, superior performance, ease-of-use, reliability and affordability. About Advanced Micro-Fabrication Equipment Inc. About Semiconductor International Magazine |
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