2016-11Shipped first single-station ICP etch product to major foundry
2016-08Shipped first 7nm dielectric etch product to major foundry; subsequently qualified to run production for critical FEOL etch production
2016-06Shipped first 2nd-generation MOCVD product to customer
2016-02Shipped first VOC product to customer
2016-01Shipped first 14nm dielectric etch product to key memory fab; subsequently qualified to run 2D NAND flash production for critical contact etch